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Home > Products > GaN Epitaxial Wafer > 4英寸碳化硅基氮化镓外延片

4英寸碳化硅基氮化镓外延片

碳化硅基氮化镓外延片
衬底尺寸: 4英寸,6英寸
衬底厚度: 500um
衬底类型:4H-SI半绝缘

Product Description

HMT公司生长供应4英寸碳化硅基氮化镓外延片,GaN-on-SiC结合了碳化硅优异的导热性和GaN高功率密度、低损耗能力,衬底上的器件可在高电压和高漏极电流下运行,结温将随RF功率缓慢升高,RF性能更好,目前多数GaN射频器件的衬底都是碳化硅。受限于SiC衬底,目前我司供应主流尺寸为4英寸与6英寸,GaN-on-SiC外延片主要用于制造微波射频器件。

碳化硅基GaN外延片结构
 

氮化镓作为第三代半导体材料,具有耐高温、兼容性高、热导率高、宽带隙等优势,在我国应用较为成熟。按照衬底材料不同,氮化镓外延片又可分为氮化镓基氮化镓、碳化硅基氮化镓、蓝宝石基氮化镓以及硅基氮化镓四类。氮化镓外延片主要用于制造电子元件,如晶体管、集成电路、光电子器件等。它可以提高电子元件的性能,提高元件的可靠性,并延长元件的使用寿命。


几种主流衬底制备外延片的应用优势

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HMT Silicon Carbide (SiC) Wafer Website: www.sicwafer-hmt.com